Programme
We are proud to present the preliminary programme of Metromeet 2009. We already have booked fantastic speakers from Nasa, PTB, Innovalia Metrology, Intel and many more. Please visit ths page more frequently to see our updates. We hope to see you in March 2009.
Keynotes
Large-area nanometer precision overlay in scanning-beam interference lithography Dr. Ralf K Heilmann - MIT Kavli Institute for Astrophysics and Space Research
Nanotechnology: An Overview and Impact on Metrology Dr. Meyya Meyyappan - NASA Ames Research Center
DMSC Offers New DMIS Certification to Enable Interoperatibility Bill Rippey - NIST
Management of Measurement Processes - Key to Success in Production Industry Prof. Robert Schmitt - RWTH Aachen University
Tutorials
3D Optical technologies for dimensional metrology: Which system do I need? Antonio Ventura - Traveset - Innovalia Metrology
Geometrical Product Specification methods: the dimensional language for the new industrial needs Mario Arias - Unimetrik
Tracks
A novel Amorphous Silicon Position Detector for multipoint monitoring systems Iván Vila Álvarez - Instituto de Física de Cantabria
Investigation Of The Phase-Change Correction Used For Gauge Block Calibration By Laser Interferometer Adisak Phuaknoi - National Institute of Metrology Thailand, NIMT
Computed Tomography on its way towards a fully accepted coordinate measuring technique Dr. Markus Bartscher - PTB
Interferometric algorithms in gauge block calibration for dimensional metrology Higinio Gonzalez Jorge - Micro and Nanotechnology area of Metrology Laboratory of Galicia
Metrology with µCT - precision challenge Jens Luebbehuesen - GE's Sensing & Inspection Technologies business
Found in the Clouds Dr. Josep Forest - AQSense
The didactics in CMM technology Maurizio Ercole - IACMM
Next Generation High Precission Micro- and Nano-Measurement Machines for Dimensional Features Characterisation Dr. Óscar Lázaro - Asociación Innovalia
OSIS- an successful industry initiative Otto Boucky - Carl Zeiss
New sensor for nm-resolution, 2D-displacement monitoring of manufacturing and metrology frames Dr. Joseph Tobiason - Micro Encoder, Inc.
Integrated Metrology (IM) in the Semiconductor Industry: Opportunities and Difficulties Menachem Shoval - Intel (TME SSI EMEA)
Surface texture measurement Dr. Khaled Mamour - Renishaw
Step gauges and CMM Traceability. Historical Study and international Comparisons Emilio Prieto Esteban - CEM length division
Why Metrology is a winning factor for the Solar Team Twente William Leenstra - Solar Team Twente 
How far was that? Metrology in sport Dr. Seton Bennett - NPL
Measurement uncertainty of optical shaft measuring systems Dr. Uwe Siefke - Jenoptik
Electronic Measurements and Digital Signal Processing for racing cars Luigi Cocco - Maserati 
Inline metrology configuration for sub-wavelength diffraction using microscope optics Timothy Kehoe - Catalan Institute of Nanotechnology