Programme

08:30 - 09:00      Registration + Coffee
09:00 - 11:15 Tutorial 1   09:00 - 11:15 Track 1 + Metrology Solutions
09:00 - 11:15

A 100 million 3D pointcloud, and now what? The art of transforming massive data in useful knowledge

Antonio Ventura - Traveset, Datapixel (Spain)
  09:00 - 09:45

Comparison between 3D Metrology Results gained with conventional CMM and High Resolution X-ray Tomography

Jens Luebbehuesen, GE's Sensing & Inspection Technologies business (Germany)

09:45 - 10:30

Nano-CMM instrumentation for large volume characterization of 3D micro-features: The Nano-CMM approach

Dr. Oscar Lazaro, Asociacion Innovalia (Spain)

10:30 - 11:15

Machine tool spindle measurement

Don Martin, Lion Precision ()
11:15 - 12:00      Coffee Break + MetroLab
12:00 - 12:30     Opening
12:30 - 13:30      Keynote

Present and future of image sensors. (How megapixel sensor technology can help optical metrology)

Martin Wäny, AWAIBA ()
13:30 - 15:00 Lunch
15:00 - 17:15 Tutorial 2   Track 2 + Optical Metrology
15:00 - 17:15

Interferometric length measurements

Prof. Erkki Ikonen, Metrology Research Institute Helsinki University of Technology (Finland)
  15:00 - 15:45

Optical and Tactile- Comparisons in Contour and Surface Metrology

Dr. -Ing. Dietrich Imkamp, Carl Zeiss Indutrial Metrology (Germany)

15:45 - 16:30

Laser scanning performance Vs traditional contact measurement

Borja de la Maza, Innovalia (Spain)

16:30 - 17:15

Lens assembly of laser diode stacks

Dr. Sead Doric, Doric Lenses (Canada)
17:15 - 18:15      Keynote

Bandwidth characteristics and comparisons of surface texture measuring instruments

Dr. Han Haitjema, Mitutoyo Research Center Europe B.V. (The Netherlands)
20:30 - 23:00       Conference Banquet
09:00 - 10:00      Keynote

Co-ordinate Measuring Machines; an overall analysis after almost 50 years.

Dr. Maurizio Ercole, Independent Researcher (Italy)
10:00 - 10:45 Coffee Break + MetroLab
Track 3 + Industrial Metrology   Track 4 + Nano & Micrometrology
10:45 - 11:30

Precision in the AutoEmoción

Ramon Paricio, SEAT (Spain)

11:30 - 12:15

Traceable Measurement of 3D Microparts

Marijn van Veghel, VSL (The Netherlands)

12:15 - 13:00

Quality control in aerospace precision castings manufacturing process. Advances and challenges

Ignacio Dominguez, PCB (Spain)
  10:45 - 11:30

Next generation of micro parts

Ernst Treffers, Xpress Precision Engineering (The Netherlands)

11:30 - 12:15

Microscale surface and form profilometry using a standing wave probe

Dr. Marcin B. Bauza, InsituTec Inc (USA)

12:15 - 13:00

Nanopositioning and Nanomeasuring Machines – 3D from Macro to Nano

Prof. Dr.-Ing. Eberhard Manske , Ilmenau University (Germany)
13:00 - 14:30       Lunch
14:30 - 15:30      Keynote

Aeronautical Metrology

Dr. William Zhang, NASA Goddard Space Flight Center (USA)
Track 5 Calibration & Verification   Track 6 + Metrological Software
15:30 - 16:15

Uncertainty determination for CMMs -- Don´t forget the influence of feature form deviations

Nick Van Gestel, Dimensional Metrology at Sirris and K.U.Leuven (Belgium)

16:15 - 17:00

Verification of coordinate measuring machines according to ISO 10360-2

Felipe Pereda, Unimetrik (Spain)

17:00 - 17:45

Modeling for Industrial Nanometer-Scale Size Metrology

Dr. John Villarrubia, NIST (USA)
  15:30 - 16:15

The development of optical metrology software during the years. An overview of available tools, the special needs for optical metrology data and actual trends.

Gerd Schwaderer, Geomagic (Germany)

16:15 - 17:00

Metrological Software Validation

Maite Tamayo - Michal Janiszek, SQS (Spain)

17:00 - 17:45

Software advances for high performance tactile scanning

Jordi Blanco, Renishaw (Spain)
17:45 - 18:15      Round Table
18:15 - 19:00       Closing Cocktail
* Simultaneous translation of all presentations will be made available to all attendees.
Todas las presentaciones tendrán traducción simultánea.
* The organization reserves the right to reschedule, add or cancel presentations.
La organización se reserva el derecho a modificar horarios, añadir o cancelar presentaciones.