Programm
Bandwidth characteristics and comparisons of surface texture measuring instruments
Dr. Han Haitjema
Mitutoyo Research Center Europe B.V. - The Netherlands
Resumen de la ponencia
In this presentation we will discuss many of the problems that are encountered when designing and carrying out comparisons of surface texture measuring instruments. Previous comparisons are discussed to highlight some of the key issues. The limitations of stylus and optical instruments are identified with a focus on the spatial bandwidths in which they operate. Guidance is given on how to design comparisons to avoid variations in the results that are due to the operating principles and bandwidth limitations of the instruments involved. Methods for matching the bandwidths of different instruments are presented and some examples are given that highlight potential problems.The software aspects of instrument comparisons are also discussed. Finally,some advice is given on how to compare profile and areal surface texturemeasurements.
Han Haitjema and Richard Leach
Información sobre el ponente
Han Haitjema obtained his MSc in Physics at the Utrecht University in 1985 and his PhD at the Delft University of Technology in 1989. Then he joined the NMi Van Swinden Laboratory, the National Measurement Institute of The Netherlands. In 1997 he moved to the Eindhoven University of Technology in Delft as assistant professor, and joined the Precision Engineering group of Prof. Schellekens. In 2004 he joined Mitutoyo as the director of Mitutoyo Research Center Europe in Best, The Netherlands. His research interests cover all aspects of dimensional metrology. During almost two decades of research work, he has published many technical papers in domestic and international journals and regularly presented his work in international conferences. During his stay at the Eindhoven University he guided six students towards their PhD in precision dimensional metrology. He is chairman of the Dutch standardisation committee for product geometry, associate member of CIRP (The International Academy for Production Engineering) and member of Euspen (European Society of Precision Engineering and Nanotechnology).